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dc.contributor.authorGorzkowska-Sobas, Agnieszka A
dc.contributor.authorLausund, Kristian Blindheim
dc.contributor.authorde Koning, Martijn
dc.contributor.authorPetrovic, Veljko
dc.contributor.authorChavan, Sachin Maruti
dc.contributor.authorSmith, Martin W.
dc.contributor.authorNilsen, Ola
dc.date.accessioned2021-12-07T14:19:17Z
dc.date.available2021-12-07T14:19:17Z
dc.date.created2021-12-01T23:52:11Z
dc.date.issued2021-09
dc.identifier.citationGorzkowska-Sobas, A., Lausund, K.B., de Koning, M.C., Petrovic, V., Chavan, S.M., Smith, M.W. & Nilsen, O. (2021) Utilizing Zirconium MOF-functionalized fiber substrates prepared by molecular layer deposition (MLD) for toxic gas capture and chemical warfare agent degradation. Global Challengesen_US
dc.identifier.issn2056-6646
dc.identifier.urihttps://hdl.handle.net/11250/2833192
dc.description.abstractMetal–organic frameworks (MOFs) are a class of porous organic-inorganic solids extensively explored for numerous applications owing to their catalytic activity and high surface area. In this work MOF thin films deposited in a one-step, molecular layer deposition (MLD), an all-gas-phase process, on glass wool fibers are characterized by X-ray diffraction, Fourier transform infrared spectroscopy, scanning electron microscopy, and their capabilities towards toxic industrial chemical (TIC) capture and chemical warfare agents (CWA) degradation are investigated. It is shown that despite low volume of the active material used, MOFs thin films are capable of removal of harmful gaseous chemicals from air stream and CWA from neutral aqueous environment. The results confirm that the MLD-deposited MOF thin films, amorphous and crystalline, are suitable materials for use in air filtration, decontamination, and physical protection against CWA and TIC.en_US
dc.language.isoengen_US
dc.publisherWiley-VCH GmbHen_US
dc.rightsNavngivelse 4.0 Internasjonal*
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/deed.no*
dc.titleUtilizing Zirconium MOF-functionalized fiber substrates prepared by molecular layer deposition (MLD) for toxic gas capture and chemical warfare agent degradationen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionpublishedVersionen_US
dc.rights.holder© 2021 The Authors.en_US
dc.subject.nsiVDP::Matematikk og Naturvitenskap: 400en_US
dc.source.journalGlobal Challengesen_US
dc.identifier.doi10.1002/gch2.202100001
dc.identifier.cristin1963067
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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